Linear PECVD plasma source
In addition to physical vapor deposition (PVD) plasma sources, we offer various chemical vapor deposition (CVD) plasma sources!
The "Linear PECVD Plasma Source" is a product similar to standard capacitively coupled plasma electrodes. It operates in an inline dynamic mode, where substrates, carriers, or webs continuously pass through the electrodes and are coated continuously. Even in cases where mechanical and electrical large-scale operations are required to uniformly coat large substrates in a stationary mode using CCP CVD, the Linear PECVD reduces spatial parameters to a one-dimensional task. It can be skillfully handled even when coating at VHF frequencies is anticipated for achieving higher coating speeds. 【Features】 ■ Capacitively coupled dynamic PECVD for continuously moving substrates ■ Continuous supply sheets, carriers, or roll-to-roll processes ■ Integrated gas distribution system on the side ■ Built-in process gas exhaust system ■ Flexible operating positions: upward, downward, vertical *For more details, please refer to the PDF document or feel free to contact us.
- Company：フォンアルデンヌジャパン
- Price：Other
